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Silanized polymeric working stamps for hot embossing lithography

Author(s):
Wissen, M. ( Univ. of Wuppertal (Germany) )
Bogdanski, N. ( Univ. of Wuppertal (Germany) )
Jerzy, R. ( Univ. of Wuppertal (Germany) )
Berrada, Z.E. ( Univ. of Wuppertal (Germany) )
Fink, M. ( micro resist technology GmbH (Germany) )
Reuther, F. ( micro resist technology GmbH (Germany) )
Glinsner, T. ( EV Group (Austria) )
Scheer, H.-C. ( Univ. of Wuppertal (Germany) )
3 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
998
Page(to):
1005
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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