Xenon recirculation systems for next-generation lithography tools

Xenon recirculation systems for next-generation lithography tools

Author(s):

Greenwood, J.R. ( BOC Edwards (United Kingdom) )
Mennie, D. ( BOC Edwards (United Kingdom) )
Hughes, C. ( BOC Edwards (United Kingdom) )
Lee, R. ( BOC Process Gas Solutions Technology (USA) )

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

991

Page(to):

997

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013722
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

Similar Items:

1 Conference Proceedings High-power x-ray point source for next-generation lithography Turcu,I.C.E., Forber,R.A., Grygier,R.K., Rieger,H., Powers,M.F., Campeau,S., French,G., Foster,R.M., Mitchell,P.V., … SPIE - The International Society for Optical Engineering	7 Conference Proceedings Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Phenolic molecular glasses as resists for next-generation lithography X. Andre, J. K. Lee, A. D. Silva, N. Felix, C. K. Ober, H. B. Cao, H. Deng, H. Kudo, D. Watanabe, T. Nishikubo SPIE - The International Society of Optical Engineering	8 Conference Proceedings Evaluation of a next-generation vector electron-beam mask pattern lithography system Rose,C., Wang,L.C., Justen,J.P., Ferreira,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Molecular glass resists for next generation lithography A. De Silva, N. Felix, J. Sha, J.-K. Lee, C. K. Ober Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Presence management in next-generation networks Wullert Ⅱ,J.R., Shim,H.S., Mouchtaris,P., Li,S.P., Chiang,C.-Y.J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Repeatable mask metrology for next-generation lithography tools Hentschel,S.L., Kamberian,H., Kovatch,J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings System-level tools and reconfigurable computing for next-generation HWIL systems Stark,D., McAulay,D., Cantle,A.J., Devlin,M. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Smart masks for next-generation lithography Huston, D.R., Sautera, W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Next Generation Ceramic Multilayer System Bacher,R.J., Wang,Y.L., Skurski,M.A., Crumpton,J.C., Nair,K.M. IMAPS
6 Conference Proceedings Reduce process bias of photomask manufacturing for next-generation lithography Lee, D. P., Wang, S., Tian, T., Yang, S., Chen, R. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Designing the next generation of user support tools:methodology Koratkar,A., Douglas,R.E.,Jr., Gerb,A., Jones,J.E., Peterson,K.A., Marel,R.P.van der SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12