High-repetition-rate MPC generator-driven capillary Z-pinch EUV source

Author(s):

Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sato, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Bessho, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Shirai, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yamatani, D. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Takemura, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yokota, T. ( Ushio Inc. (Japan) )

Paul, K.C. ( Ushio Inc. (Japan) )

Kabuki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Okubo, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hotta, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yoshioka, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Toyoda, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

10 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

935

Page(to):

942

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.2

Type:

Conference Proceedings