Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Author(s):

Oshino, T. ( Nikon Corp. (Japan) )

Yamamoto, T. ( Nikon Corp. (Japan) )

Miyoshi, T. ( Nikon Corp. (Japan) )

Shiraishi, M. ( Nikon Corp. (Japan) )

Komiya, T. ( Nikon Corp. (Japan) )

Kandaka, N. ( Nikon Corp. (Japan) )

Kondo, H. ( Nikon Corp. (Japan) )

Mashima, K. ( Nikon Corp. (Japan) )

Nomura, K. ( Nikon Corp. (Japan) )

Murakami, K. ( Nikon Corp. (Japan) )

Oizumi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )

Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )

Okazaki, S. ( Association of Super-Advanced Electronics Technologies (Japan) )

8 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

897

Page(to):

905

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.2

Type:

Conference Proceedings