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Techniques for directly measuring the absorbance of photoresists at EUV wavelengths

Author(s):
Chandhok, M. ( Intel Corp. (USA) )
Cao, H. ( Intel Corp. (USA) )
Yueh, W. ( Intel Corp. (USA) )
Gullikson, E.M. ( Lawrence Berkeley National Lab. (USA) )
Brainard, R.L. ( Rohm and Haas Microelectronics (USA) )
Robertson, S.A. ( Rohm and Haas Microelectronics (USA) )
1 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
861
Page(to):
868
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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