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200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Author(s):
Takikawa, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Ishikawa, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Yusa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kinase, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Fujita, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
3 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
727
Page(to):
739
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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