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Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons

Author(s):
Clift, W.M. ( Sandia National Labs. (USA) )
Klebanoff, L.E. ( Sandia National Labs. (USA) )
Tarrio, C. ( National Institute of Standards and Technology (USA) )
Grantham, S. ( National Institute of Standards and Technology (USA) )
Wood, O.R., II ( International SEMATECH (USA) )
Wurm, S. ( International SEMATECH (USA) )
Edwards, N.V. ( International SEMATECH (USA) )
2 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
666
Page(to):
674
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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