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Design rule of hole-layer for electron projection lithography

Author(s):
Koike, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Sakaue, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Takenaka, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Koba, F. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Tsuchida, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
1 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
495
Page(to):
501
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.1
Type:
Conference Proceedings

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