Preliminary results of EB stepper in the application of 65-nm process
- Author(s):
Takenaka, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Koike, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Tsuchida, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Koba, F. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Sakaue, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 478
- Page(to):
- 486
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.1
- Type:
- Conference Proceedings
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