Modeling for sub-50-nm x-ray application with phase masks
- Author(s):
- Taylor, J.W. ( Univ. of Wisconsin/Madison (USA) )
- Malueg, D.H. ( Univ. of Wisconsin/Madison (USA) )
- Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )
- Khan, M. ( BRAC Univ. (Bangladesh) )
- Thielman, D. ( Univ. of Wisconsin/Madison (USA) )
- Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 311
- Page(to):
- 315
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.1
- Type:
- Conference Proceedings
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