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Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials

Author(s):
Han, S.-I. ( Motorola, Inc. (USA) )
Weisbrod, E. ( Motorola, Inc. (USA) )
Wasson, J.R. ( Motorola, Inc. (USA) )
Gregory, R. ( Motorola, Inc. (USA) )
Xie, Q. ( Motorola, Inc. (USA) )
Mangat, P.J.S. ( Motorola, Inc. (USA) )
Hector, S.D. ( Motorola, Inc. (USA) )
Dauksher, W.J. ( Motorola, Inc. (USA) )
Rosfjord, K.M. ( Univ. of California/Berkeley (USA) )
4 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
261
Page(to):
270
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.1
Type:
Conference Proceedings

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