Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Author(s):

Sobel, F. ( Schott Lithotec AG (Germany) )

Aschke, L. ( Schott Lithotec AG (Germany) )

Rueggeberg, F. ( Schott Lithotec AG (Germany) )

Seitz, H. ( Schott Lithotec AG (Germany) )

Olschewski, N. ( Schott Lithotec AG (Germany) )

Reichhardt, T. ( Schott Lithotec AG (Germany) )

Becker, H. ( Schott Lithotec AG (Germany) )

Renno, M. ( Schott Lithotec AG (Germany) )

Kirchner, S. ( Schott Lithotec AG (Germany) )

Leutbecher, T. ( Schott Lithotec AG (Germany) )

Hess, G. ( Schott Lithotec AG (Germany) )

Knapp, K. ( Schott Lithotec AG (Germany) )

7 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

242

Page(to):

253

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013721
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

Similar Items:

1 Conference Proceedings Update on the EUVL mask blank activity at Schott Lithotec Sobel, F., Aschke, L., Becker, H.W., Renno, M., Ruggeberg, F., Kirchner, S., Leutbecher, T., Olschewski, N., Schiffler, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM Becker, H. W., Schley, P., Schmidt, F., Sobel, F., Renno, M., Olschewski, N., Seitz, H., Buttgereit, U., Knapp, K., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Absorber stack optimization toward EUV lithography mask blank pilot production Sobel, F., Aschke, L., Renno, M., Seitz, H., Becker, H. W., Olschewski, N., Reichardt, T., Hess, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Dry etch behavior of different TaN absorber layers for EUVL mask making F. Letzkus, G. Hess, M. Irmscher, K. Knapp, M. Renno, E. Roehrle, H. Seitz SPIE - The International Society of Optical Engineering
3 Conference Proceedings Production challenges of making EUV mask blanks Seitz, H., Sobel, F., Renno, M., Leutbecher, T., Olschewski, N., Reichardt, T., Walter, R., Becker, H., Buttgereit, U., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19] Becker, H., Renno, M., Hermanns, U., Seitz, H., Buttgereit, U., Knapp, K., Hess, G. SPIE - The International Society of Optical Engineering
4 Conference Proceedings EUVl mask blanks: recent results on substrates, multilayers, and the dry-etch process of TaN-absorbers [6151-09] Seitz, H., Renno, M., Leutbecher, T., Olschewski, N., Reichardt, T., Walter, R., Popp, H., HeB, G., Letzkus, F., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment Becker, H.W., Aschke, L., Schubert, B., Krieger, J., Lenzen, F., Yulin, S.A., Feigl, T., Kuhlmann, T., Kaiser, N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Production challenges of making an EUV mask blank(Invited Paper) Aschke, L., Becker, H. W., Friemel, F., Leutbecher, T., Olschewski, N., Renno, M., Ruggeberg, F., Schiffler, M., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Cleaning of low thermanl expansion materials for low-defect EUVL mask substrates Krueger-Velthusen, E., Friemel, F., Aschke, L., Lenzen, F. SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition Becker, H.W., Sobel, F., Aschke, L., Renno, M., Krieger, J., Buttgereit, U., HeB, G., Lenzen, F., Knapp, K., Yulin, … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18] Becker, H., Renno, M., Hermanns, U., Seitz, H., Buttgereit, U., Knapp, K., Hess, G. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12