Development of imprint materials for the Step and Flash Imprint Lithography process

Development of imprint materials for the Step and Flash Imprint Lithography process

Author(s):

Xu, F. ( Molecular Imprints, Inc. (USA) )

Stacey, N.A. ( Univ. of Texas/Austin (USA) )

Watts, M. ( Molecular Imprints, Inc. (USA) )

Truskett, V. ( Molecular Imprints, Inc. (USA) )

McMackin, I. ( Molecular Imprints, Inc. (USA) )

Choi, J. ( Molecular Imprints, Inc. (USA) )

Schumaker, P. ( Molecular Imprints, Inc. (USA) )

Thompson, E. ( Molecular Imprints, Inc. (USA) )

Babbs, D. ( Molecular Imprints, Inc. (USA) )

Sreenivasan, S.V. ( Molecular Imprints, Inc. (USA) )

Willson, C.G. ( Univ. of Texas/Austin (USA) )

Schumaker, N. ( Molecular Imprints, Inc. (USA) )

7 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

232

Page(to):

241

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013721
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

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