Fabrication process of molecular memory circuits by nanoimprint lithography

Fabrication process of molecular memory circuits by nanoimprint lithography

Author(s):

Jung, G.-Y. ( Hewlett-Parkard Labs. (USA) )

Ganapathiappan, S. ( Hewlett-Parkard Labs. (USA) )

Li, X. ( Hewlett-Parkard Labs. (USA) )

Ohlberg, D.A.A. ( Hewlett-Parkard Labs. (USA) )

Olynick, D.L. ( Lawrence Berkeley National Lab. (USA) )

Chen, Y. ( Hewlett-Packard Labs. (USA) and Hewlett-Packard Co. (USA) )

Wu, W. ( Hewlett-Packard Labs. (USA) )

Wang, S.-Y. ( Hewlett-Packard Labs. (USA) )

Tong, W.M. ( Hewlett-Packard Labs. (USA) and Hewlett-Packard Co. (USA) )

Williams, R.S. ( Hewlett-Packard Labs. (USA) )

5 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

197

Page(to):

202

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013721
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

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