EUV source power and lifetime: the most critical issues for EUV lithography
- Author(s):
Stamm, U. ( XTREME Technologies GmbH (Germany) ) Kleinschmidt, J. ( XTREME Technologies GmbH (Germany) ) Gaebel, K. ( XTREME Technologies GmbH (Germany) ) Birner, H. ( XTREME Technologies GmbH (Germany) ) Ahmad, I. ( XTREME Technologies GmbH (Germany) ) Bolshukhin, D. ( XTREME Technologies GmbH (Germany) ) Brudermann, J. ( XTREME Technologies GmbH (Germany) ) Chinh, T.D. ( XTREME Technologies GmbH (Germany) ) Flohrer, F. ( XTREME Technologies GmbH (Germany) ) Goetze, S. ( XTREME Technologies GmbH (Germany) ) Hergenhan, G. ( XTREME Technologies GmbH (Germany) ) Kloepfel, D. ( XTREME Technologies GmbH (Germany) ) Korobotchko, V. ( XTREME Technologies GmbH (Germany) ) Mader, B. ( XTREME Technologies GmbH (Germany) ) Mueller, R. ( XTREME Technologies GmbH (Germany) ) Ringling, J. ( XTREME Technologies GmbH (Germany) ) Schriever, G. ( XTREME Technologies GmbH (Germany) ) Ziener, C. ( XTREME Technologies GmbH (Germany) ) - Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 133
- Page(to):
- 144
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.1
- Type:
- Conference Proceedings
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