Design of continuous full-complex modulation proximity printing masks using a quadratic phase distribution

Design of continuous full-complex modulation proximity printing masks using a quadratic phase distribution

Author(s):

Neto, L.G. ( Univ. de Sao Paulo (Brazil) )
Cirino, G.A. ( EletroPPAr Industria Eletronica Ltda (Brazil) )
Mansano, R.D. ( Univ. de Sao Paulo (Brazil) )
Verdonck, P. ( Univ. de Sao Paulo (Brazil) )
Seabra, A.C. ( Univ. de Sao Paulo (Brazil) )

Publication title:

Micromachining technology for micro-optics and nano-optics II : 27-29 January 2004, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5347

Pub. Year:

2004

Page(from):

71

Page(to):

78

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452559 [0819452556]

Language:

English

Call no.:

P63600/5347

Type:

Conference Proceedings

Details

TDL ID:	ZA00013691
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : Micromachining Technology for Micro-Optics and Nano-Optics
Conf. info. (Number):	2004 : 2nd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2004.01.27-2004.01.29

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