High-performance thick copper inductors in an RF technology
- Author(s):
Vaed, K. ( IBM Semiconductor Research and Development Ctr. (USA) ) Graham, W. ( IBM Thomas J. Watson Research Ctr. (USA) ) Steen, M. ( IBM Thomas J. Watson Research Ctr. (USA) ) Park, J.-E. ( IBM Semiconductor Research and Development Ctr. (USA) ) Groves, R. ( IBM Semiconductor Research and Development Ctr. (USA) ) Volant, R. ( IBM Semiconductor Research and Development Ctr. (USA) ) Nunes, R. ( IBM Thomas J. Watson Research Ctr. (USA) ) Vichiconti, J. ( IBM Thomas J. Watson Research Ctr. (USA) ) Stein, K. ( IBM Semiconductor Research and Development Ctr. (USA) ) Ahlgren, D. ( IBM Semiconductor Research and Development Ctr. (USA) ) - Publication title:
- Micromachining and Microfabrication Process Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5342
- Pub. Year:
- 2004
- Page(from):
- 74
- Page(to):
- 85
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452504 [0819452505]
- Language:
- English
- Call no.:
- P63600/5342
- Type:
- Conference Proceedings
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