Effect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications

Effect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications

Author(s):

Van der Donck, T. ( IMEC (Belgium) and Katholieke Univ. Leuven (Belgium) )

Proost, J. ( Katholieke Univ. Leuven (Belgium) )

Rusu, C. ( IMEC (Belgium) )

Baert, K. ( IMEC (Belgium) )

Van Hoof, C. ( IMEC (Belgium) )

Celis, J.-P. ( Katholieke Univ. Leuven (Belgium) )

Witvrouw, A. ( IMEC (Belgium) )

2 more

Publication title:

Micromachining and Microfabrication Process Technology IX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5342

Pub. Year:

2004

Page(from):

8

Page(to):

18

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452504 [0819452505]

Language:

English

Call no.:

P63600/5342

Type:

Conference Proceedings

Details

TDL ID:	ZA00013686
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : Micromachining and Microfabrication Process Technology
Conf. info. (Number):	2004 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2004.01.27-2004.01.29

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