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Determination of residual stress in low-temperature PECVD silicon nitride thin films

Author(s):
Publication title:
Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5276
Pub. Year:
2004
Page(from):
451
Page(to):
462
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451699 [081945169X]
Language:
English
Call no.:
P63600/5276
Type:
Conference Proceedings

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