Apparent positive resistance and temperature effect on I-V characteristics of RTD
- Author(s):
Miao, C. ( Tianjin Polytechnic Univ. (China) ) Guo, W. ( Tianjin Univ. (China) ) Niu, P.-J. ( Tianjin Polytechnic Univ. (China) ) Liu, H. ( Tianjin Polytechnic Univ. (China) ) Li, H.-Q. ( Tianjin Polytechnic Univ. (China) ) Qu, D. ( Tianjin Polytechnic Univ. (China) ) Xu, Z. ( Tianjin Polytechnic Univ. (China) ) - Publication title:
- Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5276
- Pub. Year:
- 2004
- Page(from):
- 408
- Page(to):
- 413
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451699 [081945169X]
- Language:
- English
- Call no.:
- P63600/5276
- Type:
- Conference Proceedings
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