Identification and elimination of trench crystal defects in sub-0.13-μm era

Identification and elimination of trench crystal defects in sub-0.13-μm era

Author(s):

Yeh, C.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Chen, C.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lu, T.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Shen, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Chuang, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lee, J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Fu, C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Sheu, Y.-D. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

3 more

Publication title:

Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5276

Pub. Year:

2004

Page(from):

360

Page(to):

364

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451699 [081945169X]

Language:

English

Call no.:

P63600/5276

Type:

Conference Proceedings

Details

TDL ID:	ZA00013618
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for MEMS, microelectronics, and photonics
Conf. info. (Number):	2003 : 3rd
Conf. info. (Venue):	Perth, Australia
Conf. info. (Date):	2003.12.10-2003.12.12

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