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An investigation of SU-8 resist adhesion in deep x-ray lithography of high-aspect-ratio structures

Author(s):
  • Barber, R.L. ( Swinburne Univ. of Technology (Australia) and CRC for Microtechnology (Australia) )
  • Ghantasala, M.K. ( Swinburne Univ. of Technology (Australia) and CRC for Microtechnology (Australia) )
  • Divan, R. ( Argonne National Lab. (USA) )
  • Mancini, D.C. ( Argonne National Lab. (USA) )
  • Harvey, E.C. ( Swinburne Univ. of Technology (Australia) and CRC for Microtechnology (Australia) )
Publication title:
Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5276
Pub. Year:
2004
Page(from):
85
Page(to):
91
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451699 [081945169X]
Language:
English
Call no.:
P63600/5276
Type:
Conference Proceedings

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