A new domino failure mechanism in deep sub-100-nm technologies and its solution
- Author(s):
- Yang, G. ( Univ. of California/Santa Cruz (USA) )
- Kang, S.-M. ( Univ. of California/Santa Cruz (USA) )
- Publication title:
- Microelectronics: Design, Technology, and Packaging
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5274
- Pub. Year:
- 2004
- Page(from):
- 70
- Page(to):
- 76
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451675 [0819451673]
- Language:
- English
- Call no.:
- P63600/5274
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
OPC accuracy and process window verification methodology for sub-100-nm node
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
New resolution enhancement technology for manufacturing sub-100-nm technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |