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EUV mask simulation for AIMS

Author(s):
Windpassinger, R. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Rosenkranz, N. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Scherubl, T. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Evanschitzky, P. ( Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany) )
Erdmann, A. ( Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany) )
Zibold, A. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1249
Page(to):
1258
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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