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EUV radiation damage test on EUVL mask absorber materials

Author(s):
Lu, B. ( Motorola, Inc. (USA) )
Wasson, J.R. ( Motorola, Inc. (USA) )
Han, S.-I. ( Motorola, Inc. (USA) )
Mangat, P. ( Motorola, Inc. (USA) )
Golovkina, V. ( Univ. of Wisconsin/Madison (USA) )
Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1232
Page(to):
1238
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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