Blank Cover Image

Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool

Author(s):
Lai, R. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsu, L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Kung, C.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hung, J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Huang, W.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yoo, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Huang, Y.-T. ( KLA-Tencor Corp. (Taiwan) )
Hsu, V. ( KLA-Tencor Corp. (Taiwan) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1156
Page(to):
1167
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Multibeam high-resolution UV wavelength reticle inspection

Hung,C.C., Yoo,C.S., Lin,C.H., Volk,W.W., Wiley,J.N., Khanna,S., Biellak,S., Wang,D.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks

Kim, W.D., Akima, S., Aquino, C.M., Becker, C., Eickhotf, M.D., Narita, T., Quah, S.-K., Rohr, P.M., Schlaffer, R., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Multibeam high-resolution UV wavelength reticle inspection

Hung,C.C., Yoo,C.S., Lin,C.-H., Volk,W.W., Wiley,J.N., Khanna,S., Biellak,S., Wang,D.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Shieh, W.B., Chou, W., Yang, C.-H., Wu, J.K., Chen, N., Yen, S.M., Hsu, T., Tuan, S., Chang, D., Rudzinski, M.W., Wang, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings 130-nm reticle inspection using multibeam UV-wavelength database inspection

Aquino, C., Schlaffer, R.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node

Wallace, C., Schacht, J., Huang, I.H., Hsu, R.H.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings High-performance reticle inspection tool for the 65-nm node and beyond

T. -Y. Kang, C. -H. Chen, C. -H. Ho, L. Hsu, Y. -C. Ku, K. Nakamura, H. Moribe, T. Bashomatsu, K. Matsumura, K. Hatta, …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Hsu, S., Chu, T. -B., Van Den Broeke, D., Chen, J. F., Hsu, M., Corcoran, N. P., Volk, W., Ruch, W. E., Sier, J. -P., …

SPIE - The International Society of Optical Engineering
5 Conference Proceedings New die-to-database inspection algorithm for inspection of 90-nm node reticles

Garcia, H.I., Volk, W.W., Watson, S., Hess, C., Aquino, C., Wiley, J., Mack, C.A.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Multibeam resolution die-to database reticle inspection

Volk, W.W., Broadbent, W.H., Garcia, H.I., Waston, S.G., Lim, P.M., Ruch, W.E.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L., Liao, C.-H., Dai, Y.-M., Lin, J.-C., Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 257-nm wavelength mask inspection for 65-nm node reticles

Yoshikawa, R., Tanizaki, H., Watanabe, T., Inoue, H., Ogawa, R., Endo, S., Ikeda, M., Takahashi, Y., Watanabe, H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12