Global CD uniformity improvement in mask manufacturing for advanced lithography
- Author(s):
Chang, S.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chin, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Wang, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsay, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Yen, Y.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chin, S.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Liu, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, K.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Ku, Y.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 1065
- Page(to):
- 1071
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
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