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Global CD uniformity improvement in mask manufacturing for advanced lithography

Author(s):
Chang, S.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Wang, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsay, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yen, Y.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, S.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, K.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
9 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1065
Page(to):
1071
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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