Influence of antireflection coatings in ArF lithography

Influence of antireflection coatings in ArF lithography

Author(s):

La Fontaine, B.M. ( Advanced Micro Devices, Inc. (USA) )

Pawloski, A.R. ( Advanced Micro Devices, Inc. (USA) )

Acheta, A. ( Advanced Micro Devices, Inc. (USA) )

Deng, Y. ( Advanced Micro Devices, Inc. (USA) and Univ. of California/Berkeley (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Spence, C. ( Advanced Micro Devices, Inc. (USA) )

Chovino, C. ( DuPont Photomasks, Inc. (USA) )

Dieu, L. ( DuPont Photomasks, Inc. (USA) )

Johnstone, E. ( DuPont Photomasks, Inc. (USA) )

Kalk, F. ( DuPont Photomasks, Inc. (USA) )

5 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

995

Page(to):

1005

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013601
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

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