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Experimental investigation of hard pellicle purge processes

Author(s):
Abdo, A.Y. ( Univ. of Wisconsin/Madison (USA) )
Nellis, G.F. ( Univ. of Wisconsin/Madison (USA) )
Diab, A.K. ( Univ. of Wisconsin/Madison (USA) )
Cotte, E.P. ( Univ. of Wisconsin/Madison (USA) )
Chalekian, A.J. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Peski, C.V. ( International SEMATECH (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
897
Page(to):
904
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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