A new concept of image imbalance correction for phase-shift mask lithography at 65 nm

A new concept of image imbalance correction for phase-shift mask lithography at 65 nm

Author(s):

Kamat, V.G. ( Synopsys, Inc. (USA) )
Kroyan, A. ( Synopsys, Inc. (USA) )

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

834

Page(to):

841

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013601
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65] Van Look, L., Kasprowicz, B., Zibold, A., Degel, W., Vandenberghe, G. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Full phase-shifting methodology for 65-nm node lithography Pierrat, C., Driessen, F.A.J.M., Vandenberghe, G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Effects of alternating aperture PSM design on image imbalance for 65-nm technology Kroyan, A., Liu, H.-Y. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Alternatives to alternating phase-shift masks for 65 nm Torres, J.A., Maurer, W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Practical approach for AAPSM image imbalance correction for sub-100-nm lithography Cho, H.L., Lin, S.Y., Hsieh, F., Kroyan, A., Liu, H.-Y., Huang, J.H., Hsu, S.-H., Huang, I-H., Lin, B.S.-M., Hung, K.-C. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Defect printability analysis on alternating phase-shifting masks for 193-nm lithography Morikawa, Y., Totsu, Y., Nishiguchi, M., Hoga, M., Hayashi, N., Pang, L., Luk-Pat, G.T. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Implementing AAPSM in 90-nm product with practical image imbalance correction Lin, B.S., Hsu, S.-, Huang, I.H., Chen, K., Hsieh, F., Hsu, T., Liu, H.-Y., Kroyan, A., Hsu, F., Huang, J. SPIE - The International Society of Optical Engineering	10 Conference Proceedings High-alignment-accuracy EB writing of phase shift image for 65-nm node masks Kimura, N., Komagata, T., Nakagawa, Y., Gotoh, N., Tanaka, K. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Evaluation of overlay accuracy of phase-shift image for 65-nm node masks Komagata, T., Kimura, N., Funaki, K., Nakagawa, Y., Gotoh, N. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask Petersen,J.S., Williams,A.M., Rich,G.K., Miller,D.A., Martinez,A.M.,Jr. SPIE-The International Society for Optical Engineering
6 Conference Proceedings New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask Dao,G.T., Liu,G., Snyder,A., Farnsworth,J.N. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Minimization of image placement errors in chromeless phase-shift mask lithography Fritze, M., Tyrrell, B., Cann, S.G., Carney, C., Blachowicz, B.A., Brzozowy, D., Kocab, T., Bowdoin, S., Rhyins, P.D., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12