Blank Cover Image

200-mm EPL stencil mask fabrication and metrology

Author(s):
Fujita, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Takigawa, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Ishikawa, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Aritsuka, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Yusa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
826
Page(to):
833
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Takikawa, T., Ishikawa, M., Yusa, S., Kinase, Y., Fujita, H., Hoga, M., Hayashi, N., Sano, H.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Development of a LEEPL mask: flatness and IP measurements

Aritsuka, Y., Kitada, M., Kurosawa, M., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Evaluation of image placement of EPL stencil masks

Yusa, S., Ishikawa, M., Kinase, Y., Takikawa, T., Fujita, H., Sano, H., Houga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Development of LEEPL 6025 format mask blanks

Aritsuka, Y., Iimura, Y., Hoga, M., Sano, H.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings CD-measurement technique for hole patterns on stencil mask

Ishikawa, M., Yusa, S., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H., Eguchi, H., Yoshii, T., Tamura, A.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Experimental analysis of image placement accuracy of single-membrane masks for LEEPL [5853-81]

Kitada, M., Aritsuka, Y., Yusa, S., Kuwahara, N., Fujita, H., Takikawa,T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

M. Ishikawa, M. Sakaki, N. Kuwahara, H. Fujita, T. Takikawa, H. Sano, M. Hoga, N. Hayashi

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]

Kitada, M., Yusa, S., Kuwahara, N., Fujita, H., Takikawa, T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making

Sano, H., Morimoto, K., Aritsuka, Y., Fujita, H.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Evaluation of a transmission CD-SEM for EB stencil masks

Ishikawa, M., Fujita, H., Hoga, M., Sano, H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Subfield distortion of an EPL stencil mask

Takenaka, H., Yamashita, H., Koike, K., Yamabe, M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12