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Study of dry etching pattern profile of chromeless phase lithography (CPL) mask

Author(s):
Lin, J. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsu, M. ( ASML MaskTools, Inc. (USA) )
Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsu, S.D. ( ASML MaskTools, Inc. (USA) )
Shi, X. ( ASML MaskTools, Inc. (USA) )
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )
Chen, J.F. ( ASML MaskTools, Inc. (USA) )
Tang, F.C. ( Winbond Electronics Corp. (Taiwan) )
Hsieh, W.A. ( Winbond Electronics Corp. (Taiwan) )
Huang, C.Y. ( Winbond Electronics Corp. (Taiwan) )
5 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
806
Page(to):
813
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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