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EUV mask making: an approach based on the direct patterning of the EUV reflector

Author(s):
Chovino, C. ( DuPont Photomasks, Inc. (USA) )
Dieu, L. ( DuPont Photomasks, Inc. (USA) )
Johnstone, E. ( DuPont Photomasks, Inc. (USA) )
Reyes, J. ( DuPont Photomasks, Inc. (USA) )
La Fontaine, B.M. ( Advanced Micro Devices, Inc. (USA) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Pawloski, A.R. ( Advanced Micro Devices, Inc. (USA) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
566
Page(to):
572
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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