EUV substrate and blank inspection with confocal microscopy

EUV substrate and blank inspection with confocal microscopy

Author(s):

Urbach, J.-P. ( International SEMATECH (USA) )
Cavelaars, J.F.W. ( International SEMATECH (USA) )
Kusunose, H. ( Lasertec Corp. (Japan) )
Liang, T. ( Intel Corp. (USA) )
Stivers, A.R. ( Intel Corp. (USA) )

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

556

Page(to):

565

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013600
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks Stivers, A.R., Liang, T., Penn, M.J., Lieberman, B., Shelden, G.V., Folta, J.A., Larson, C.C., Mirkarimi, P.B., Walton, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings EUV blank inspection J. H. Peters, C. Tonk, D. Spriegel, H.-S. Han, W. Cho Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Inspection of EUV reticles Pettibone, D.W., Veldman, A., Liang, T., Stivers, A.R., Mangat, P.J., Lu, B., Hector, S.D., Wasson, J.R., Bleadel, K.L., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center W. Cho, P. A. Kearney, E. M. Gullikson, A. Jia, T. Tamura, A. Tajima, H. Kusunose, C. Jeon SPIE - The International Society of Optical Engineering
3 Conference Proceedings Pattern inspection of EUV masks using DUV light Liang, T., Tejnil, E., Stivers, A.R. SPIE-The International Society for Optical Engineering	9 Conference Proceedings EUV mask patterning approaches Yan,P., Zhang,G., Kofron,P., Chow,J., Stivers,A.R., Tejnil,E., Cardinale,G.F., Kearney,P.A. SPIE - The International Society for Optical Engineering
4 Conference Proceedings UV inspection of EUV and SCALPEL reticles Pettibone,D.W., Bareket,N., Liang,T., Stivers,A.R., Hector,S.D., Mangat,P.J.S., Resnick,D.J., Lercel,M.J., Lawliss,M., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49] Kim, S. S., Park, J., Chalykh, R., Kang, J., Lee, S., Woo, S. G., Cho, H. K., Moon, J. T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings EUV mask absorber characterization and selection Yan,P., Zhang,G., Kofron,P., Powers,J.E., Tran,M., Liang,T., Stivers,A.R., Lo,F.-C. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Damage-free mask repair using electron-beam-induced chemical reactions Liang, T., Stivers, A.R. SPIE-The International Society for Optical Engineering
6 Conference Proceedings On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet [5992-136] Tsai, K. -Y., Gullikson, E., Kearney, P., Stivers, A. SPIE - The International Society of Optical Engineering	12 Conference Proceedings EUV mask fabrication with Cr absorber Mangnat,P.J., Hector,S.D., Rose,S., Cardinale,G.F., Tenjil,E., Stivers,A.R. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12