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Investigation of smart inspection of critical layer reticles using additional designer data to determine defect significance

Author(s):
Volk, W.W. ( KLA-Tencor Corp. (USA) )
Hess, C. ( KLA-Tencor Corp. (USA) )
Ruch, W. ( KLA-Tencor Corp. (USA) )
Yu, Z. ( KLA-Tencor Corp. (USA) )
Ma, W. ( KLA-Tencor Corp. (USA) )
Fisher, L. ( Texas Instruments Inc. (USA) )
Vickery, C. ( Texas Instruments Inc. (USA) )
Ma, Z.M. ( Texas Instruments Inc. (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
489
Page(to):
499
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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