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Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring

Author(s):
Pang, L. ( Synopsys, Inc. (USA) )
Lu, A. ( Semiconductor Manufacturing International Corp. (China) )
Chen, J. ( Semiconductor Manufacturing International Corp. (China) )
Guo, E. ( Semiconductor Manufacturing International Corp. (China) )
Cai, L. ( Synopsys, Inc. (USA) )
Chen, J.-H. ( Synopsys, Inc. (USA) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
461
Page(to):
473
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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