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Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Author(s):
Kim, Y.-D. ( Photronics-PKL Co., Ltd. (South Korea) )
Lee, D.-S. ( Photronics-PKL Co., Ltd. (South Korea) )
Park, D.-I. ( Photronics-PKL Co., Ltd. (South Korea) )
Kwon, H.-J. ( Photronics-PKL Co., Ltd. (South Korea) )
Kim, J.-M. ( Photronics-PKL Co., Ltd. (South Korea) )
Jung, S.-M. ( Photronics-PKL Co., Ltd. (South Korea) )
Choi, S.-S. ( Photronics-PKL Co., Ltd. (South Korea) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
392
Page(to):
399
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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