Blank Cover Image

Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake

Author(s):
Berger, L. ( STEAG HamaTech AG (Germany) )
Dress, P. ( STEAG HamaTech AG (Germany) )
Gairing, T. ( STEAG HamaTech AG (Germany) )
Chen, J.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
380
Page(to):
391
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback

Berger, L., Saule, W., Dress, P., Gairing, T.M., Chen, C.-J., Lee, H.-C., Hsieh, H.-C.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Modeling soft-bake effects in chemically amplified resists

Byers, J.D., Smith, M.D., Mack, C.A., Biafore, J.J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

Irmscher, M., Berger, L., Beyer, D., Butschke, J., Dress, P., Hoffmann, T., Hudek, P., Koepernik, C., Tschinkl, M., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists

Smith,M.D., Mack,C.A., Petersen,J.S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings CD performance of CA-resits with dynamically controlled multizone bake system

Sasaki, S., Kurihara, M., Mohri, H., Hayashi, N., Dress, P., Noering, A., Gairing, T.M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

Pain,L., Gourgon,C., Patterson,K., Scarfogliere,B., Tedesco,S.V., Fanget,G.L., Dal'Zotto,B., Ribeiro,M., Kusumoto,T., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Improved baking of photomasks by a dynamically zone-controlled process approach

Dress,P., Gairing,T.M., Saule,W., Dietze,U.U., Szekeresch,J.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists

Pain,L., Sala,F., Higgins,C., Dal'zotto,B., Tedesco,S.V.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Influence of the baking process for chemically amplified resist on CD performance

Sasaki, S., Ohfuji, T., Kurihara, M., Inomata, H., Jackson, C.A., Murata, Y., Totsukawa, D., Tsugama, N., Kitano, N., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Road to a zero degree total temperature range post exposure bake process

T. Wähler, P. Dress

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Post soft-bake delay effect on CD variation in DUV resist

Tsai, S.-F., Chen, C.-Y., Chan, K.-T., Gao, H.-Y., Ku, C.-Y.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings High-resolution negative-tone chemically amplified i-line resists

Rutter, Jr., E. W., Root, J. C., Bacchetti, L. F.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12