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Effects of reticle reflectance on lithography

Author(s):
Cummings, K.D. ( ASML (USA) )
Geh, B. ( Carl Zeiss (Germany) )
Lu, B. ( Motorola, Inc. (USA) )
Wasson, J.R. ( Motorola, Inc. (USA) )
Weisbrod, E. ( Motorola, Inc. (USA) )
Dauksher, W.J. ( Motorola, Inc. (USA) )
Nordquist, K.J. ( Motorola, Inc. (USA) )
Mangat, P. ( Motorola, Inc. (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
256
Page(to):
265
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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