Blank Cover Image

Model-based methodology for reducing OPC output pattern complexity

Author(s):
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
238
Page(to):
245
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings A methodology to calculate line-end correction feature performance as a function of reticle cost

Melvin, L.S., III, Shiely, J.P., Rieger, M.L., Painter, B.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Maintaining lithographic quality during OPC for low-k1 and MEEF processes constrained by mask dimensional rules

Cork, C. M., Melvin III, L. S., Milier, M., Lugg, R. M., Rieger, M. L.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Model-based interpretation filtering for complex two-dimensional layout features

Melvin, L.S., III, Shiely, J.P., Cork, C.M., Rieger, M.L.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Mathematically describing the target contour in silicon such that model-based OPC can best realize design intent

Cork, C.M., Balasingam, P., Sandvik, S., Kielhorn, B., Rieger, M.L.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Classical control theory applied to OPC correction segment convergence

Painter, B., Melvin, L.L., III, Rieger, M.L.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Advanced model formulations for optical and process proximity correction

Beale, D.F., Shiely, J.P., Melvin, L.L., III, Rieger, M.L.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Model based pattern matching

L. S. Melvin III, J. Tuttle, M. Boman

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Anticipating and controlling mask costs within EDA physical design (Invited Paper)

Rieger, M.L., Mayhew, J.P., Melvin, L.S., Lugg, R.M., Beale, D.F.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Alternating PSM optimization using model-based OPC

Tritchkov,A., Stirniman,J.P., Rieger,M.L.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings A methodology to calculate line-end correction feature performance as a function of reticle cost

III, L.S.M., Shiely, J.P., Rieger, M.L., Painter, B.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Placing assist features in layout using a process model

Melvin III, L. S., Shiely, J. P., Rieger, M. L.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Off -target model based OPC [5992-179]

Lu, M., Liang, C., King, D., Melvi III, L. S.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12