157-nm attenuated phase-shift mask materials with irradiation stability

157-nm attenuated phase-shift mask materials with irradiation stability

Author(s):

Wasson, J.R. ( Motorola, Inc. (USA) )
Edwards, N.V. ( Motorola, Inc. (USA) )
Lu, B. ( Motorola, Inc. (USA) )
Mangat, P. ( Motorola, Inc. (USA) )
Grenville, A. ( International SEMATECH (USA) )

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

199

Page(to):

203

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013600
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings EUV radiation damage test on EUVL mask absorber materials Lu, B., Wasson, J.R., Han, S.-I., Mangat, P., Golovkina, V., Cerrina, F. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials Han, S.-I., Weisbrod, E., Wasson, J.R., Gregory, R., Xie, Q., Mangat, P.J.S., Hector, S.D., Dauksher, W.J., Rosfjord, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication Lu, B., Wasson, J.R., Weisbrod, E., Mangat, P., Ainley, E., Rios, A., Nordquist, K.J. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Defect printability and inspection of EUVL mask Lu, B., Wasson, J. R., Mangat, P. J. S., Cobb, J. L., Hector, S. D., Pettibone, D. W., O'Connell, D. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Attenuating phase-shifting mask at 157 nm Liberman, V., Rothschild, M., Spector, S.J., Krohn, K.E., Cann, S.C., Hien, S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Image placement error due to pailern transfer for EUV masks Masnyj, Z.S., Wasson, J.R., Lu, B., Weisbrod, E., Mangat, P.J.S., Nordquist, K.J., Ainley, E.S., Dauksher, W.J., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Integration of antireflection coatings on EUV absorber stacks Wasson, J.R., Han, S.-I., Edwards, N.V., Weisbrod, E., Dauksher, W.J., Mangat, P.J.S., Pettibone, D.W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications Chey,S.J., Guarnieri,C.R., Babich,K., Pope,K.R., Goldfarb,D., Angelopoulos,M., Racette,K.C., Hibbs,M.S., Gibson,M.L., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Investigation of attenuated phase-shifting mask material for 157-nm lithography Onodera,T., Matsuo,T., Itani,T., Morimoto,H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Substrate defect smoothing of EUVL mask blanks using TaSiN films Wasson,J.R., Hopson,T., Mangat,P.J.S., Hector,S.D. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12