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Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Author(s):
Omori, S. ( Sony Corp. (Japan) )
Iwase, K. ( Sony Corp. (Japan) )
Amai, K. ( Sony Corp. (Japan) )
Watanabe, Y. ( Sony Corp. (Japan) )
Nohama, S. ( Sony Corp. (Japan) )
Nohdo, S. ( Sony Corp. (Japan) )
Moriya, S. ( Sony Corp. (Japan) )
Kitagawa, T. ( Sony Corp. (Japan) )
Yotsui, K. ( Toppan Printing Co., Ltd. (Japan) )
Suzuki, G. ( Toppan Printing Co., Ltd. (Japan) )
Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )
6 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
132
Page(to):
142
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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