Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography
- Author(s):
Mancini, D.P. ( Motorola, Inc. (USA) ) Gehoski, K.A. ( Motorola, Inc. (USA) ) Dauksher, W.J. ( Motorola, Inc. (USA) ) Nordquist, K.J. ( Motorola, Inc. (USA) ) Resnick, D.J. ( Motorola, Inc. (USA) ) Schumaker, P. ( Molecular Imprints, Inc. (USA) ) McMackin, I. ( Molecular Imprints, Inc. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 122
- Page(to):
- 131
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
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