Optimization of a 65-nm alternating phase-shift quartz etch process
- Author(s):
Anderson, S.A. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Anderson, S.A., III ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Buie, M.J. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Chandrachood, M. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Clevenger, J.O. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Lee, Y. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Sandlin, N.L. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Ding, J. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 66
- Page(to):
- 75
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Study of the role of Cl2, O2, and He in the chrome etch process with optical emission spectroscopy
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Exploring the 65nm frontier of alternating phase shifting masks with a quartz dry etch chemistry
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
In-situ optical emission spectroscopic examination of chrome etch for photomasks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Advanced CD linearity improvement for multiproject wafers and SoC at 95-nm technology node
SPIE-The International Society for Optical Engineering |