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Cell projection EB exposure for Giga DRAM device mask

Author(s):
Shin, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Lim, M. ( Hynix Semiconductor Inc. (South Korea) )
Lee, Y. ( Hynix Semiconductor Inc. (South Korea) )
Choi, B.-K. ( Hynix Semiconductor Inc. (South Korea) )
Choi, Y. ( Hynix Semiconductor Inc. (South Korea) )
Han, O. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
42
Page(to):
49
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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