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DUV mask writer for BEOL 90-nm technology layers

Author(s):
Hong, D. ( Cypress Semiconductor Corp. (USA) )
Krishnan, P. ( Cypress Semiconductor Corp. (USA) )
Coburn, D. ( Cypress Semiconductor Corp. (USA) )
Jeewakhan, N. ( Cypress Semiconductor Corp. (USA) )
Xie, S. ( Cypress Semiconductor Corp. (USA) )
Broussard, J. ( Cypress Semiconductor Corp. (USA) )
Ferguson, B. ( Cypress Semiconductor Corp. (USA) )
Green, K.G. ( DuPont Photomasks, Inc. (USA) )
Buck, P. ( DuPont Photomasks, Inc. (USA) )
Jackson, C.A. ( DuPont Photomasks, Inc. (USA) )
Martinez, L. ( DuPont Photomasks, Inc. (USA) )
6 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
9
Page(to):
19
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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