Blank Cover Image

Integration and optimization of the DUV ALTA pattern generation system using a CAR process with the Tetra photomask etch system

Author(s):
  • Buxbaum, A.H. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
  • Fuller, S.E. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
  • Montgomery, W. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
  • Ungureit, M.E. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1
Page(to):
8
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characterization of an integrated multibeam laser mask-pattern generation and dry etch processing total solution

Buxbaum,A., Buie,M.J., Stoehr,B., Montgomery,W., Fuller,S.E.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Implementation and characterization of a DUV raster-scanned mask pattern generation system

Bohan,M.J., Hamaker,H.C., Montgomery,W.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Photoresist processing for high-resolution DUV lithography at 257 nm

Fuller,S.E., Montgomery,W., Albelo,J.A., Rodrigues,W., Buxbaum,A.H.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Advantages of isofocal printing in maskmaking with the ALTA 3500

Fuller,S.E., Pochkowski,M.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Next-generation DUV ALTA mask patterning capabilities

Allen, P. C., Christenson, E. R., Hamaker, H. C., Howells, S. C., Kenan, B., Pirogovsky, P., Sadiq, M. K., Teitzel, R. …

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Evaluation of a new-generation photomask develop system for CAR

Cantrell, R., Tschinkl, M., Feicke, A., Porsche, W., Lee, G., Kotoda, T., Tichy, P., Fukai, T., Kamei, S., Asai, H.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings DUV ALTA system aerial image enhancement for improved pattern fidelity

Allen, P.C., Buxbaum, A.H., Howells, S.C., Kenan, B., Klatchko, A., Pirogovsky, P.Y., Teitzel, R., White, M.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Brooks, C.B., Anderson, R.B., III, Clevenger, J.O., Collard, C., Halim, M., Sahin, T., Mak, A.W.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Photolithographic evaluation of deep-UV resist materials for mask-making applications

Montgomery,W., Buxbaum,A.H., Rodrigues,W., Albelo,J.A., Fuller,S.E.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Photomask-edge-roughness characterization using an atomic force microscope

Fuller,S.E., Young,M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II

Ungureit, M.E., Howells, S.C., Chabreck, T., Hubbard, J., Klatchko, A., Pirogovsky, P.Y., Teitzel, R.L., Berwick, A., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Performance of the ALTA 3500 scanned-laser mask lithography system

Buck,P.D., Buxbaum,A.H., Coleman,T.P., Tran,L.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12