A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode
- Author(s):
Maldonado, J.R. ( Etec Systems, Inc. (USA) ) Coyle, S.T. ( Etec Systems, Inc. (USA) ) Shamoun, B. ( Etec Systems, Inc. (USA) ) Yu, M. ( Etec Systems, Inc. (USA) ) Thomas, T.N. ( TKD, Inc. (USA) ) Holmgren, D.E. ( Etec Systems, Inc. (USA) ) Chen, X. ( Etec Systems, Inc. (USA) ) DeVore, B. ( Etec Systems, Inc. (USA) ) Scheinfein, M.R. ( Simon Frasier Univ. (Canada) ) Gesley, M.A. ( Etec Systems, Inc. (USA) ) - Publication title:
- Nanofabrication Technologies
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5220
- Pub. Year:
- 2003
- Page(from):
- 46
- Page(to):
- 51
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450937 [0819450936]
- Language:
- English
- Call no.:
- P63600/5220
- Type:
- Conference Proceedings
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