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EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

Author(s):
Kierey, H. ( Carl Zeiss Laser Optics GmbH (Germany) )
Heidemann, K.F. ( Carl Zeiss Laser Optics GmbH (Germany) )
Kleemann, B.H. ( Carl Zeiss Laser Optics GmbH (Germany) )
Winters, R. ( Carl Zeiss Laser Optics GmbH (Germany) )
Egle, W/J. ( Carl Zeiss Laser Optics GmbH (Germany) )
Singer, W. ( Carl Zeiss SMT AG (Germany) )
Melzer, F. ( Carl Zeiss SMT AG (Germany) )
Wevers, R. ( Carl Zeiss SMT AG (Germany) )
Antoni, M. ( Carl Zeiss SMT AG (Germany) )
4 more
Publication title:
Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5193
Pub. Year:
2004
Page(from):
70
Page(to):
78
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819450661 [0819450669]
Language:
English
Call no.:
P63600/5193
Type:
Conference Proceedings

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